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Photoluminescence and electronic spectroscopy in metal-oxide thin ?films, with the prospect of application in extreme-ultraviolet lithography.

dc.rights.licenseCC-BY-NC-ND
dc.contributor.advisorBrouwer, F
dc.contributor.advisorMeijerink, A
dc.contributor.advisorImhof, A
dc.contributor.authorTusscher, L. ten
dc.date.accessioned2017-09-28T17:01:34Z
dc.date.available2017-09-28T17:01:34Z
dc.date.issued2017
dc.identifier.urihttps://studenttheses.uu.nl/handle/20.500.12932/27810
dc.description.sponsorshipUtrecht University
dc.format.extent4248051
dc.format.mimetypeapplication/pdf
dc.language.isoen
dc.titlePhotoluminescence and electronic spectroscopy in metal-oxide thin ?films, with the prospect of application in extreme-ultraviolet lithography.
dc.type.contentMaster Thesis
dc.rights.accessrightsOpen Access
dc.subject.keywordsthin films, luminescence, hafnium, zirconium, tin, raman, XRD, AFM, lithography
dc.subject.courseuuNanomaterials: Chemistry and Physics


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